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Hynix Semiconductor Inc. Chungbuk Kor | 論文
- Effect of Poly Metal Gate Etch Post-Cleaning on the Tail Distribution of DRAM Data Retention Time
- Impact of Gate Etch Damage and Profile in High Density DRAM Cell
- Impact of Polymetal Gate Etch Post-Cleaning on Data Retention Time in Sub-micron DRAM Cells
- Low-Damage Gate Etching With High Degree of Anisotropy in High-Density DRAM Cell
- High Pressure Synthesis of a New Perovskite, (SrLa)(MgMn)O_
- X-Ray Absorption Spectroscopic Studies on Layered FeWO_4Cl and Its Lithium Intercalate
- Physico-Chemical Characterization of Na_3Zr_2Si_2PO_ Fine Powders Prepared by Sol-Get Method Using Citrates
- The Effect of Lithium Intercalation on the Crystal Structure and Magnetic Property of Layered FeWO_4Cl