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Hynix Semiconductor Co. Ltd. Kyoungki‐do Kor | 論文
- Lithographic Performances of Non-Chemically Amplified Resist and Chemically Amplified Resist for l93-nm Top Surface Imaging Process
- Dielectric Properties of Hydrogen Silsesquioxane Films Degraded by Heat and Plasma Treatment
- Complex Formation of U(VI) with Benzamidoxime in Non-aqueous Solvents