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Devices and Materials Laboratory, LG Electronics | 論文
- Microstructure and Light-Scattering Properties of ZnO:Al Films Prepared Using a Two-Step Process through the Control of Oxygen Pressure
- Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Fabrication of Sub-100 nm Linewidth Grating Patterns Using Nanoimprint Lithography(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))