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Department of Rheumatology,Juntendo University School of Medicine | 論文
- CLINICAL KINESIOLOGY IN LOW BACK PAIN
- Prognosis of Long-Term Plasmapheresis in Patients with Rheumatoid Arthritis : Reumatoid Arthritis
- Changes in the Viscosities of Blood and Plasma Due to Lymphocytapheresis in Patients with Rheumatoid Arthritis : Reumatoid Arthritis
- Prognosis in the Long-Term Plasmapheresis for Patients with Systemic Lupus Erythematosus : Autoimmune Disease
- Peripheral Blood Stem Cells Harvest in Patients with Hematologic Malignancies : Using COBE Spectra(Hematological Disease,General Presentation,Proceedings of the Thirteenth Annual Meeting of Japanese Society for Apheresis)
- Immunoadsorption Therapy for Removal of IgG Rheumatoid Factor(Collagen Disease,General Presentation,Proceedings of the Thirteenth Annual Meeting of Japanese Society for Apheresis)
- Plasmapheresis in the Treatment of Raynaud's Syndrome : Index of Blood and Plasma Viscosity(Collagen Disease,General Presentation,Proceedings of the Thirteenth Annual Meeting of Japanese Society for Apheresis)
- Changes in the Blood and Plasma Viscosities According to the Treated Quantity of Plasma by Plasmapheresis in Patients with Rheumatoid Arthritis(Collagen Disease,General Presentation,Proceedings of the Thirteenth Annual Meeting of Japanese Society for Aphe
- Therapeutic Lymphocytapheresis on Patients with Rheumatoid Arthritis : Comparison between Leukocyte Removal Filter Method and Centrifugal Method(Collagen Disease,General Presentation,Proceedings of the Thirteenth Annual Meeting of Japanese Society for Aph
- Formation of InGaAs-On-Insulator Structures by Epitaxial Lateral Over Growth from (111) Si
- Changes in Plasma Bradykinin Levels as a Result of Various Procedures for Therapeutic Plasmapheresis and Due to Differences in Anticoagulant : Biocompatibility
- R&D of Surface Wave Excited Plasma
- Nanohardness of Newly Developed Dentin Coating Materials
- PLASMAPHERESIS : HISTORICAL PERSPECTIVE AND NEW TRENDS
- Nucleation and Growth Control of Al-CVD for Dual-Damascene Application
- Simple Kinetic Model of ECR-RIBE Reacor for the Optimization of GaAs Etching Process
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