スポンサーリンク
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan | 論文
- Ab Initio Calculation of F Atom Desorption in Tungsten Chemical Vapor Deposition Process Using WF6 and H2
- A Theoretical Study on the Realistic Low Concentration Doping in Silicon Semiconductors by Accelerated Quantum Chemical Molecular Dynamics Method
- Quantum Chemical Molecular Dynamics Studies on the Chemical Mechanical Polishing Process of Cu Surface
- Quantum Chemical Calculations of Sulfur Doping Reactions in Diamond CVD
- Computational Chemistry Study on Crystal Growth of InGaN/GaN