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Department of Electronics, Faculty of Engineering Tohoku University | 論文
- Improvement of Rinsing Efficiency after Sulfuric Acid Hydrogen Peroxide Mixture (H_2SO_4/H_2O_2) by HF Addition
- A Model for the Electrochemical Deposition and Removal of Metallic Impurities on Si Surfaces (Special Issue on Scientific ULSI Manufacturing Technology)
- Improvement of Rinsing Efficiency after Sulfuric Acid Hydrogen Peroxide Mixture ( H2SO4/H2O2) by HF Addition