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Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University | 論文
- Process Optimization of Plasma-Enhanced Chemical Vapor Deposited Passivation Thin Films for Improving Nonvolatile Memory IC Performance
- Local Thinning-Induced Oxide Nonuniformity Effect on the Tunneling Current of Ultrathin Gate Oxide(Semiconductors)
- Effects of Methyl Silsesquioxane Electron-Beam Curing on Device Characteristics of Logic and Four-Transistor Static Random-Access Memory