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Department Of Electronics And Information Science Kyoto Institute Of Technology:(present Address) De | 論文
- Simple Hexagonal Coulomb Crystal near a Deformed Plasma Sheath Boundary in a Dusty Plasma
- Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases