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Department Of Electrical And Electronic Systems Engineering Graduate School Of Information Science A | 論文
- Second-Harmonic Generation in Pulsed-Laser-Deposited BaTiO_3 Thin Films
- Time-of-Flight Distributions of Si Atoms Ejected by KrF Laser Ablation of Si_3N_4
- Radical Beams Produced by Laser Ablation and Their Application ( Plasma Processing)
- Piezoelectric Sensing of Particles Produced by Pulsed-Laser Ablation of YBa_2Cu_3O_
- Effect of Ambient Oxygen Gas on the Transport of Particles Produced by Laser Ablated YBa_2Cu_3O_
- Time-of-Flight Measurement of Particles with Laser-Induced Fluorescence in the Plume Produced by Laser Ablation of YBa_2Cu_3O_ Target
- Tuning Range of a CW Cr^:LiSAF Laser Spectrally Narrowed by an Auxiliary Cavity
- Mechanism of a Tuning Operation of a Ti:Sapphire Laser by Injection-Seeding
- Spectral Narrowing of a Pulsed Dye Laser Injected Monochromatic Radiation
- Powerful Narrow-Band Dye Laser Forced Oscillator
- -P106- A STUDY OF PHASIC FLOW PATTERNS AND RESERVED CAPA CITY OF BYPASS GRAFT FLOW IN AORTOCORONARY BYPASS GRAFTING PATIENTS
- Auto-Reset Forward DC-DC Converter with Fast Transient Response for High-Current/Low-Voltage Applications(Analog Circuit Techniques and Related Topics)
- Particle-initiated Breakdown Characteristics around Spacer under Lightning Impulse Voltage Superimposed on Pre-stressed DC
- Wire Particle Motion Behavior and Breakdown Characteristics around Different Shaped Spacers within Diverging Air Gap
- Wire Particle Motion Behavior and Breakdown Characteristics around Different Shaped Spacers within Diverging Air gap
- Study of Hemodynamic Changes with Oxygen Inhalation in VSD Associated with Pulmonary Hypertension
- Dynamics of Output Spectra within a Single Laser Pulse from a Line-Narrowed Excimer Laser
- Resonant Multiphoton Ionization of H_2 by an ArF Laser and Application to Atmospheric Molecules
- Laser Spectroseopic Detection of Radicals in the Photolysis of Disilane with an ArF Laser
- Characteristics of Plasma-Enhanced Photoemission from Thin Films during Plasma-Assisted Chemical Vapor Deposition