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Center for X-ray Optics, Lawrence Berkeley National Laboratory | 論文
- Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength
- Transmission X-Ray Microscopy with 50 nm Resolution Installed at Ritsumeikan Synchrotron Radiation Center
- "Actinic-only" Defects in Extreme Ultraviolet Lithography Mask Blanks : Native Defects at the Detection Limit of Visible-Light Inspection Tools