Toyoda Hirotaka | Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-863, Japan
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- Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-863, Japanの論文著者
Department of Electrical Engineering and Computer Science, Nagoya University, Nagoya 464-863, Japan | 論文
- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma
- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)