Yamamichi Shintaro | ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japan

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概要

• Yamamichi Shintaroの詳細を見る
• 同名の論文著者
• ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japanの論文著者

関連著者

• YABUTA Hisato

  Fundamental Research Laboratories, NEC Corporation

• SONE Shuji

  Fundamental Research Laboratories, NEC Corporation

• Yamamichi Shintaro

  Ulsi Device Development Laboratories Nec Corporation

• Lesaicherre Pierre-yves

  Ulsi Device Development Laboratories Nec Corporation

• Kato Yoshitake

  Fundamental Research Laboratories Nec Corporation

• Yoshida Masaji

  Fundamental Research Laboratories Nec Corporation

• Iizuka Toshihiro

  Ulsi Device Development Laboratory Nec Corporation

• Nishimoto Shozo

  Ulsi Device Development Laboratories Nec Corporation

• YAMAGUCHI Hiromu

  ULSI Device Development Laboratories, NEC Corporation

• Yabuta Hisato

  Fundamental Research Laboratories, NEC Corporation, 4-1-1 Miyazaki, Miyamae-ku, Kawasaki, Kanagawa 216, Japan

• Yamamichi Shintaro

  ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japan

• Iizuka Toshihiro

  ULSI Device Development Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229, Japan

• Kato Yoshitake

  Fundamental Research Laboratories, NEC Corporation, 4-1-1 Miyazaki, Miyamae-ku, Kawasaki, Kanagawa 216, Japan

• Sone Shuji

  Fundamental Research Laboratories, NEC Corporation, 4-1-1 Miyazaki, Miyamae-ku, Kawasaki, Kanagawa 216, Japan

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著作論文

• Low Temperature Deposition of (Ba, Sr)TiO3 Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

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