Ishiwara H. | Dept. of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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- Dept. of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technologyの論文著者
Dept. of Electronics and Applied Physics, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology | 論文
- Electrical characteristics of OFETs with thin gate dielectric
- Electrical characteristics of OFETs with thin gate dielectric
- Modulation of PtSi work function by alloying with low work function metal(Session 7A : Gate Oxides)