Shimada Hiroyuki | Technology Platform Research Center, Seiko Epson Corporation, Fujimi 281, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan

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概要

• Shimada Hiroyukiの詳細を見る
• 同名の論文著者
• Technology Platform Research Center, Seiko Epson Corporation, Fujimi 281, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japanの論文著者

関連著者

• Maruyama Koichi

  NV Trial-manufacturing Team, Seiko Epson Corporation, Fujimi 281, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan

• Shimada Hiroyuki

  Technology Platform Research Center, Seiko Epson Corporation, Fujimi 281, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan

著作論文

• Highly Selective Etching of Tantalum Electrode to Thin Gate Dielectrics Using SiCl4-NF3 Gas Mixture Plasma

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