YUTANI A. | Process Technology Development Div., Renesas Technology Corporation
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概要
Process Technology Development Div., Renesas Technology Corporation | 論文
- A Novel Contact-plug Process with Low Resistance Nucleation Layer Using B_2H_6-reduction W-ALD Method for 32nm CMOS Devices and Beyond
- Highly Reliable Cu Interconnect using Low Hydrogen Silicon Nitride Film Deposited at Low Temperature for Cu-Diffusion Barrier