Sasakawa Tomohiro | Faculty of Engineering and High-Technology Research Center, Kansai University, Suita, Osaka 564-8680, Japan
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- Faculty of Engineering and High-Technology Research Center, Kansai University, Suita, Osaka 564-8680, Japanの論文著者
Faculty of Engineering and High-Technology Research Center, Kansai University, Suita, Osaka 564-8680, Japan | 論文
- Growth of Hydrogenated Amorphous Silicon by an Inductive Coupling Glow Discharge Reactor
- Local Adhesion of Diamond-Like Carbon Films Coated on Substrates in a Trench-shaped Cathode
- Annealing of Se^+-Implanted GaAs Encapsulated with As-Doped a-Si:H
- GaAs Films Heteroepitaxially Grown on Si Substrates by Mixture Beams of Ions and Molecules
- Role of Hydrogen in Improvement of the Critical Temperature of Ceramic YBa_2Cu_3O_ by Proton Implantation