Uetsuka Hisato | Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
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- Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japanの論文著者
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan | 論文
- Fabrication and Characterization of Non-Doped SiO2 Cladding Layer for Polarization-Insensitive Silica Waveguide by Using Plasma Enhanced Chemical Vapor Deposition
- Fabrication of Waveguide-Type Add/Drop Grating Filter by Radio-Frequency Magnetron Sputtering to Insert GeO2–SiO2 Cladding Layers