Ota Hiroyuki | MIRAI Project---Nanodevice Innovation Research Center (MIRAI-NIRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan

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• MIRAI Project---Nanodevice Innovation Research Center (MIRAI-NIRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japanの論文著者

MIRAI Project---Nanodevice Innovation Research Center (MIRAI-NIRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan | 論文

• Fabrication of Direct-Contact Higher-k HfO2 Gate Stacks by Oxygen-Controlled Cap Post-Deposition Annealing

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