Koda Seiichiro | Department of Chemical System Engineering, School of Engineering, University of Tokyo
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概要
Department of Chemical System Engineering, School of Engineering, University of Tokyo | 論文
- Elementary Surface Reaction Simulation of Aluminum Chemical Vapor Deposition from Dimethylaluminumhydride Based on Ab Initio Calculations : Theoretical Process Optimization Procedure(2)
- Optical and Electrical Properties of β-FeSi_2/Si, β-FeSi_2/InP Heterojunction Prepared by RF-Sputtering Deposition
- Effect of Flow Mode of Gas-Liquid Phase in Graphite-Felt Cathode on Electrochemical Production of Hydrogen Peroxide
- プラズマCVD法による金属-活性炭複合電極のキャパシタ特性
- Phytoplankton Decomposition Process (PDP) Model Dealing with Carbon and Nitrogen Budget on Particulate Organic Matter