MIURA Tadao | Electron Device Engineering Laboratory, Toshiba Corporation
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概要
Electron Device Engineering Laboratory, Toshiba Corporation | 論文
- Effect of Ion Doping Conditions on Electrical Conductivity of Amorphous Silicon Films and Its Application to Thin Film Transistors
- Afterimage Improvement for Thin-Film Diode (TFD) Liquid-Crystal Display Utilizing Tantalum Anodic Oxidation in Ammonium Borate Solution
- Display Performance Improvement of Thin-Film Diode Liquid-Crystal Display by a Low-Temperature Anodizing Method
- Bus Electrode Having Same Thermal Expansion Coefficient as Crystalline Silicon Solar Cell : II-2: SILICON SOLAR CELLS (3)
- Efficiency Improvement of Solar Cell utilizing Plasma-deposited Silicon Nitride : I-2: SILICON SOLAR CELLS (2) : Polycristalline Silicon