Sato Emiko | New Industry Creation Hatchery Center, Tohoku University
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概要
New Industry Creation Hatchery Center, Tohoku University | 論文
- Low frequency noise in Si(100) and Si(110) p-channel MOSFETs (シリコン材料・デバイス)
- Suppression of the low frequency noise level in (100) and (110) oriented silicon p-MOSFETs induced by an alkali-free cleaning process
- High current drivability FD-SOI CMOS with low Source/Drain series resistance (Silicon devices and materials)
- High Current Drivability FD-SOI CMOS with Low Source/Drain Series Resistance(Session 9B : Nano-Scale devices and Physics)
- High Current Drivability FD-SOI CMOS with Low Source/Drain Series Resistance(Session 9B : Nano-Scale devices and Physics)