HAKOZAKI Tomohiro | Department of Chemical Engineering, Faculty of Engineering, Kyoto University
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概要
Department of Chemical Engineering, Faculty of Engineering, Kyoto University | 論文
- Silicorn Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition
- Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition frorn Silicon Tetraacetate
- Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Silicon Dioxide Thin Films Prepared Thermal Decomposition of Silicon Tetraacetate : Surfaces, Interfaces and Films
- NO_x Removal Using Ammonia Radicals Prepared by Intermittent Dielectric Barrier Discharge at Atmospheric Pressure