Yoshimoto Mamoru | Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
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- Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japanの論文著者
Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan | 論文
- Atomically Stepped Glass Surface Formed by Nanoimprint
- Fabrication of Ni/Al2O3/Ni Heteroepitaxial Junction by Post-Hydrogen Reduction of NiO/Al2O3/NiO Trilayered Epitaxial Thin Film
- Influence of Rapid Thermal Annealing and Substrate Terrace Width on Self-Organizing Formation of Periodic Straight Nanogroove Array on NiO(111) Epitaxial Thin Film