Ishihara Takamitsu | Advanced LSI Technology Laboratory, Research & Development Center, Toshiba Corporation
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- Advanced LSI Technology Laboratory, Research & Development Center, Toshiba Corporationの論文著者
Advanced LSI Technology Laboratory, Research & Development Center, Toshiba Corporation | 論文
- Impact of Strained-Si Channel on CMOS Circuit Performance under the Sub-100nm Regime
- Quantitative Understanding of Electron Mobility Limited by Coulomb Scattering in MOSFETs with N_2O and NO Oxynitrides