CERRINA Franco | Center for X-ray Lithography, University of Wisconsin-Madison
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概要
Center for X-ray Lithography, University of Wisconsin-Madison | 論文
- Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method for Sub-0.25 μm X-Ray Lithography System
- Dissolution Study of a Novolak-Based Photoresist Based on a Developer Diffusion Model