Okigawa Mitsuru | Institute of Fluid Science, Tohoku University, 2-1-1 Katahira Aoba-ku, Sendai-shi, Miyagi 980-8577, Japan

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概要

関連著者

Samukawa Seiji
Institute Of Fluid Science Tohoku University
Okigawa Mitsuru
Institute Of Fluid Science Tohoku University
Ishikawa Yasushi
Institute Of Fluid Science Tohoku University
Okigawa Mitsuru
Institute of Fluid Science, Tohoku University, 2-1-1 Katahira Aoba-ku, Sendai-shi, Miyagi 980-8577, Japan
Ishikawa Yasushi
Institute of Fluid Science, Tohoku University, 2-1-1 Katahira Aoba-ku, Sendai-shi, Miyagi 980-8577, Japan
Samukawa Seiji
Institute of Fluid Science, Tohoku University, 2-1-1 Katahira Aoba-ku, Sendai-shi, Miyagi 980-8577, Japan

著作論文

Plasma-Radiation-Induced Interface States in Metal-Nitride-Oxide-Silicon Structure of Charge-Coupled Device Image Sensor and Their Reduction Using Pulse-Time-Modulated Plasma

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