Matsuoka Fumitomo | Toshiba America Electronic Components, Inc., 2070, Route 52, Hopewell Junction, NY 12533, U.S.A.

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概要

• Matsuoka Fumitomoの詳細を見る
• 同名の論文著者
• Toshiba America Electronic Components, Inc., 2070, Route 52, Hopewell Junction, NY 12533, U.S.A.の論文著者

関連著者

• Matsuoka Fumitomo

  Toshiba America Electronic Components, Inc., 2070, Route 52, Hopewell Junction, NY 12533, U.S.A.

• Kakumu Masakazu

  Lsi Division Ii Toshiba Corporation

• Kakumu Masakazu

  The Memory Division Toshiba Corporation

• Kondo Toshiyuki

  The Memory Division Toshiba Corporation

• Matsuoka Fumitomo

  TOSHIBA Microelectronics Corporation

• Ishimaru Kazunari

  the Semiconductor Device Engineering Laboratory, TOSHIBA CORPORATION

• Gojohbori Hiroshi

  the Semiconductor Device Engineering Laboratory, TOSHIBA CORPORATION

• Koike Hidetoshi

  TOSHIBA Microelectronics Corporation

• Unno Yukari

  TOSHIBA Microelectronics Corporation

• Sai Manabu

  TOSHIBA Microelectronics Corporation

• Ichikawa Ryuji

  the Memory Division, TOSHIBA CORPORATION

• Matsuoka F

  Toshiba Corp. Yokohama Jpn

• Ichikawa Ryuji

  The Memory Division Toshiba Corporation

• Ishimaru Kazunari

  The Semiconductor Device Engineering Laboratory Toshiba Corporation

• Gojohbori Hiroshi

  The Semiconductor Device Engineering Laboratory Toshiba Corporation

• Ohuchi Kazuya

  Toshiba America Electronic Components, Inc., 2070, Route 52, Hopewell Junction, NY 12533, U.S.A.

• Kusunoki Naoki

  Toshiba America Electronic Components, Inc., 2070, Route 52, Hopewell Junction, NY 12533, U.S.A.

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著作論文

• Accurate Measurement of Silicide Specific Contact Resistivity by Cross Bridge Kelvin Resistor for 28 nm Complementary Metal--Oxide--Semiconductor Technology and Beyond
• High-Density Full-CMOS SRAM Cell Technology with a Deep Sub-Micron Spacing between nMOS and pMOSFET (Special Section on High Speed and High Density Multi Functional LSI Memories)

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