Tatsumi Tetsuya | Process Technology Department, Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan

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• Process Technology Department, Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japanの論文著者

Process Technology Department, Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan | 論文

• Evaluation of Property Changes due to Radiation, Radicals, and Ions on Organic Low-$k$ Films in H2/N2 Plasma Etching

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