Mun Seong | Process Engineering Dept. 5, MagnaChip Semiconductor Ltd., 1 Hyangjeong-dong, Hungduk-gu, Cheongju-si 361-725, Korea

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• Process Engineering Dept. 5, MagnaChip Semiconductor Ltd., 1 Hyangjeong-dong, Hungduk-gu, Cheongju-si 361-725, Koreaの論文著者

Process Engineering Dept. 5, MagnaChip Semiconductor Ltd., 1 Hyangjeong-dong, Hungduk-gu, Cheongju-si 361-725, Korea | 論文

• Layout Dependent Induced Leakage and its Prevention with Different Shallow Trench Isolation Schemes in 0.18 μm Dual Gate Complementary Metal Oxide Semiconductor Technology

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