Fukatsu Shigeto | Department of Applied Physics and Physico-Informatics and CREST-JST, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan

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• Department of Applied Physics and Physico-Informatics and CREST-JST, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japanの論文著者

Department of Applied Physics and Physico-Informatics and CREST-JST, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan | 論文

• The Effect of Partial Pressure of Oxygen on Self-Diffusion of Si in SiO2

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