Sakashita Mitsuo | Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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概要
- Sakashita Mitsuoの詳細を見る
- 同名の論文著者
- Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japanの論文著者
関連著者
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Sakashita Mitsuo
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Zaima Shigeaki
Center For Cooperative Research In Advanced Science & Technology Nagoya University
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Yasuda Yukio
Department Of Applied Physics Faculty Of Engineering Nagoya University
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Sakai Akira
Department Of Agricultural Chemistry The University Of Tokyo
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Sakashita Mitsuo
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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SATAKE Masaki
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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Naito Shinya
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Ikeda Hiroya
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Kondo Hiroki
Deparment Of Physics Saga University
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Goto Tomokazu
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Yasuda Yukio
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Satake Masaki
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Zaima Shigeaki
Center for Cooperative Research in Advanced Science and Technology, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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Satake Masaki
Department of Applied Chemistry, Faculty of Engineering, Tohoku University
著作論文
- Growth of Silicon Nanocrystal Dots with High Number Density by Ultra-High-Vacuum Chemical Vapor Deposition
- Local Leakage Current of HfO2 Thin Films Characterized by Conducting Atomic Force Microscopy