Xuan Yi | MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Central 4, Tsukuba, Ibaraki 305-8562, Japan

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• MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Central 4, Tsukuba, Ibaraki 305-8562, Japanの論文著者

MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Central 4, Tsukuba, Ibaraki 305-8562, Japan | 論文

• Growth of HfSiOx films by Vapor–Liquid Hybrid Deposition Utilizing Si(OC2H5)4/Hf(tOC4H9)4 Multilayer Adsorption

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