Miura Takashi | Industrial Research Institute of Ishikawa (IRII)
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概要
Industrial Research Institute of Ishikawa (IRII) | 論文
- Preparation of Low-Stress SiN_x Films by Catalytic Chemical Vapor Deposition at Low Temperatures
- Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition
- Moisture-Resistive Properties of SiN_x Films Prepared by Catalytic Chemical Vapor Deposition below 100℃ for Flexible Organic Light-Emitting Diode Displays
- Effect of Atomic Hydrogen on Preparation of Highly Moisture-Resistive SiN_x Films at Low Substrate Temperatures
- E-2 Ultrasonic Linear Actuator Using Elastic Hinge Structure(Bulk wave devices, High power ultrasound)