Park Hong | Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd. San #24, Nongseo-Ri, Giheung-Eup, Yongin-City, Gyonggi-Do 449-711, Korea

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• Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd. San #24, Nongseo-Ri, Giheung-Eup, Yongin-City, Gyonggi-Do 449-711, Koreaの論文著者

Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd. San #24, Nongseo-Ri, Giheung-Eup, Yongin-City, Gyonggi-Do 449-711, Korea | 論文

• Effects of Post-Deposition Annealing on the Electrical Properties of HfSiO Films Grown by Atomic Layer Deposition

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