Liang Hsiao-Bin | Department of Electrical Engineering, National Chi-Nan University
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Department of Electrical Engineering, National Chi-Nan University | 論文
- Stress Reliability Comparison of Metal-Oxide-Semiconductor Devices with CoSi_2 and TiSi_2 Gate Electrode Materials
- An Analysis of Layout and Temperature Effects on Magnetic-Coupling Factor, Resistive-Coupling Factor, and Power Gain Performances of RF Transformers for RFIC Applications