Fujii Toshiaki | Department of Electrical and Electronic Engineering, Meijo University, Tempaku-ku, Nagoya 468-8502, Japan

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• Department of Electrical and Electronic Engineering, Meijo University, Tempaku-ku, Nagoya 468-8502, Japanの論文著者

Department of Electrical and Electronic Engineering, Meijo University, Tempaku-ku, Nagoya 468-8502, Japan | 論文

• Fabrication of Multilayered SiOCH Films with Low Dielectric Constant Employing Layer-by-Layer Process of Plasma Enhanced Chemical Vapor Deposition and Oxidation

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