Hui-Wen Cheng | Institute of Communication Engineering, National Chiao Tung University, Hsinchu 300, Taiwan
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- Institute of Communication Engineering, National Chiao Tung University, Hsinchu 300, Taiwanの論文著者
Institute of Communication Engineering, National Chiao Tung University, Hsinchu 300, Taiwan | 論文
- Comparative Study of Multigate and Multifin Metal–Oxide–Semiconductor Field-Effect Transistor
- Discrete-Dopant-Induced Power-Delay Characteristic Fluctuation in 16 nm Complementary Metal–Oxide–Semiconductor with High Dielectric Constant Material