スポンサーリンク
Institute of Communication Engineering, National Chiao Tung University, Hsinchu 300, Taiwan | 論文
- Comparative Study of Multigate and Multifin Metal–Oxide–Semiconductor Field-Effect Transistor
- Discrete-Dopant-Induced Power-Delay Characteristic Fluctuation in 16 nm Complementary Metal–Oxide–Semiconductor with High Dielectric Constant Material