Satake Hideki | Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

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• Satake Hidekiの詳細を見る
• 同名の論文著者
• Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japanの論文著者

Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan | 論文

• Suppression of Stress-Induced Leakage Current of Wet and Dry SiO2 by SiD4 Poly-Si Gate Electrode

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