OHMIYA MAYUMI | DEPARTMENT OF ELECTRICAL ENGINEERING, FACULTY OF ENGINEERING, DOSHISHA UNIVERSITY
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- OHMIYA MAYUMIの詳細を見る
- 同名の論文著者
- DEPARTMENT OF ELECTRICAL ENGINEERING, FACULTY OF ENGINEERING, DOSHISHA UNIVERSITYの論文著者
DEPARTMENT OF ELECTRICAL ENGINEERING, FACULTY OF ENGINEERING, DOSHISHA UNIVERSITY | 論文
- Silicorn Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition
- Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition frorn Silicon Tetraacetate
- Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Structure and tribological properties of Ti-Al-N films prepared by plasma-based ion implantation mixing
- Deposition of Tungsten Carbide Thin Films by Simultaneous RF Sputtering