Kim Chang-Il | School of Electrical and Electronics Engineering, Chung-Ang University, 221, Heukseuk-dong, Dongjak-gu, Seoul 156-756, Korea
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- School of Electrical and Electronics Engineering, Chung-Ang University, 221, Heukseuk-dong, Dongjak-gu, Seoul 156-756, Koreaの論文著者
School of Electrical and Electronics Engineering, Chung-Ang University, 221, Heukseuk-dong, Dongjak-gu, Seoul 156-756, Korea | 論文
- Etch Characteristics of ZrO2 Thin Films in High Density Plasma
- Etch characterization of TiO2 thin films using metal-insulator-metal capacitor in adaptively coupled plasma (Special issue: Dry process)
- Etch properties of TiN thin film in metal-insulator-metal capacitor using inductively coupled plasma (Special issue: Dry process)