Navamathavan Rangaswamy | Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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概要
- Navamathavan Rangaswamyの詳細を見る
- 同名の論文著者
- Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Koreaの論文著者
関連著者
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Ra Yong-Ho
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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Navamathavan Rangaswamy
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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Yong-Ho Ra
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Lee Young-Min
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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Rangaswamy Navamathavan
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Cha Jun-Ho
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Ki-Young Song
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Hong-Chul Lim
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Ji-Hyeon Park
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Dong-Wook Kim
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Cheul-Ro Lee
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Jun-Ho Cha
Semiconductor Materials Process Laboratory, School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-dong 664-14, Chonju 561-756, Korea
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Lee Cheul-Ro
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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Kim Dong-Wook
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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Song Ki-Young
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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Park Ji-Hyeon
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
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Jun Baek
Semiconductor Materials Processing Laboratory, School of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, 664-14 Deokjin-dong, Deokjingu, Jeonju 561-756, Korea
著作論文
- Highly Uniform Characteristics of GaN Nanorods Grown on Si(111) by Metalorganic Chemical Vapor Deposition
- Effect of H2 Carrier Gas on the Growth of GaN Nanowires on Si(111) Substrates by Metalorganic Chemical Vapor Deposition