Niiyama Hiromi | Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
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Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation | 論文
- Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution
- Thermal Decomposition of Dissolution Inhibitor in Chemically Amplified Resist during Prebake Process
- Contamination Charging up Effect in a Variably Shaped Electron Beam Writer
- Electron Beam Calibration Method for Character Projection Exposure System EX-8D
- Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match