NISHIOKA Y. | Texas Instruments Tsukuba Research and Development Center Ltd.
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概要
関連著者
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NISHIOKA Y.
Texas Instruments Tsukuba Research and Development Center Ltd.
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KOBAYASHI H.
Department of Mechanical Science and Bioengineering, School of Engineering Science, Osaka University
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YAMASHITA Y.
Department of IE and Management, College of Industrial Technology, Nihon University
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Nakato Y.
Department Of Chemistry Faculty Of Engineering Science And Research Center For Photoenergetics Of Or
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KATO H.
Photon Factory, National Laboratory for High Energy Physics
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Komeda T.
Texas Instruments Tsukuba R&d Center
著作論文
- Interface States for Ultrathin Chemical Oxide Layers on Si(111) and Si(100)
- Atomic Configuration of Segregated B on Si(001) Surface