Matsuyama Isamu | Optoelectronics Technology Research Laboratory:(present Address) Semiconductor Technology Laboratori
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- Matsuyama Isamuの詳細を見る
- 同名の論文著者
- Optoelectronics Technology Research Laboratory:(present Address) Semiconductor Technology Laboratoriの論文著者
Optoelectronics Technology Research Laboratory:(present Address) Semiconductor Technology Laboratori | 論文
- Effects of GaAs-Surface Roughness on the Electron-Beam Patterning Characteristics of a Surface-Oxide Layer
- In Situ Fabrication of Buried GaAs/AlGaAs Quantum-Well Mesa-Stripe Structures with Improved Regrown Interfaces
- In situ Electron-beam Processing for GaAs/AlGaAs Nano-structures
- Improvement in Patterning Characteristics of GaAs Oxide Mask Used in In Situ Electron-Beam Lithography
- In Situ GaAs Patterning and Subsequent Molecular-Beam Epitaxial Regrowth of AlGaAs/GaAs Wire Structures