Cho Kwang-nam | Research Center For Electronic Materials And Components Department Of Electronic Engineering Hanyang
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Research Center For Electronic Materials And Components Department Of Electronic Engineering Hanyang | 論文
- Remote Plasma-Assisted Metal Organic Chemical Vapor Deposition of Tantalum Nitride Thin Films with Different Radicals
- Barrier Metal Properties of Amorphous Tantalum Nitride Thin Films between Platinum and Silicon deposited using Remote Plasma Metal Organic Chemical Vapor Method