Lin L. | Department of Crystalline Materials Science, Nagoya University

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概要

• 同名の論文著者
• Department of Crystalline Materials Science, Nagoya Universityの論文著者

関連著者

• Lin L.

  Department of Crystalline Materials Science, Nagoya University

• Shen Z.

  Department Of Applied Physics Stanford University

• ANDO Y.

  Department of Applied Physics, Graduate school of engineering Tohoku University

• Matsui M.

  Department of Communications and Systems Engineering, The University of Electro-Communications

• Ando Y

  Tohoku University Dept. Of Applied Physics

• ANDO Y.

  Graduate School of Engineering, Tohoku University

• Ando Y

  Department Of Crystalline Materials Science Nagoya University

• Higashida D.

  Department of Crystalline Materials Science, Nagoya University

• Doi M.

  Department of Crystalline Materials Science, Nagoya University

• Asano H.

  Department of Crystalline Materials Science, Nagoya University

• Higashida D.

  Department Of Crystalline Materials Science Nagoya University

• DOI M.

  Nagoya University

• Lin L

  Department Of Crystalline Materials Science Nagoya University

• Liang Y.

  Department Of Materials Science And Engineering Jilin University At Nanling Campus

• Matsui M

  Department Of Crystalline Materials Science Nagoya University

• Doi M.

  Department Of Crystalline Materials Science Nagoya University

• LUHMANN Jr.

  Department of Electrical and Computer Engineering, UC Davis, USA

• ITO N.

  Art, Science and Technology Center for Cooperative Research, Kyushu University, Japan

• DOMIER C.

  Department of Electrical and Computer Engineering, UC Davis, USA

• JOHNSAON M.

  Department of Electrical and Computer Engineering, UC Davis, USA

• MASE A.

  Art, Science and Technology Center for Cooperative Research, Kyushu University, Japan

• SAKATA E.

  Kyushu Hitachi Maxell, Ltd, Japan

• SHEN Z.

  Department of Electrical and Computer Engineering, UC Davis, USA

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著作論文

• Dependence on γ-Fe and Cu thickness of magneto-optical Kerr effect for [γ-Fe/Cu] epitaxial multilayers
• Protection Filters in ECEI Systems for Plasma Diagnostics

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