Goto Masahiro | National Industrial Research Institute Of Nagoya:advanced Science Research Center Japan Atomic Energ
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概要
- 同名の論文著者
- National Industrial Research Institute Of Nagoya:advanced Science Research Center Japan Atomic Energの論文著者
関連著者
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Goto Masahiro
National Industrial Research Institute Of Nagoya:advanced Science Research Center Japan Atomic Energ
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GOTO Masahiro
National Institute for Materials Science
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Xu Yibin
National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan
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Kato Ryozo
National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan
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Goto Masahiro
National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan
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TOSA Masahiro
National Institute for Materials Science
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KASAHARA Akira
National Institute for Materials Science
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PIHOSH Yuriy
National Institute for Materials Science
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Igarashi Kazuo
National Industrial Research Institute Of Nagoya
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Tanemura Sakae
National Industrial Research Institute Of Nagoya
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KUSUNOKI Michiko
Japan Fine Ceramics Center, FCT Central Research Department
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Takamasu Tadashi
National Institute For Materials Science
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TAI Yutaka
National Institute of Advanced Industrial Science and Technology
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Tai Y
National Industrial Research Institute Of Nagoya
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MURAKAMI Junichi
National Industrial Research Institute of Nagoya
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Turkevych Ivan
National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
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Murakami J
Toyama Prefectural Univ. Toyama Jpn
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Kusunoki Michiko
Japan Fine Ceramics Center
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Kasahara Akira
National Center for Atmospheric Research
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Takamasu Tadashi
National Institute for Material Science, Tsukuba, Ibaraki 305-0047, Japan
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Tai Yutaka
National Industrial Research Institute of Nagoya
著作論文
- Micro-patterned organic electroluminescent devices (Special issue: Molecular electronics and bioelectronics)
- Generation of Novel Aluminum Nano Balls
- A New Technique for Enhancing Sensitivity of the $2\omega$ Method by Applying a Bismuth Film Thermoreflectance Sensor on Top of the Metal Film--Dielectric Substrate Sample
- Development of a Frequency-Domain Method Using Completely Optical Techniques for Measuring the Interfacial Thermal Resistance between the Metal Film and the Substrate