Jeong Chang | Department Of Materials Engineering Sungkyunkwan University
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概要
Department Of Materials Engineering Sungkyunkwan University | 論文
- Effect of N_2O to C_4F_8/O_2 on Global Warming during Silicon Nitride Plasma Enhanced Chemical Vapor Deposition (PECVD) Chamber Cleaning Using a Remote Inductively Coupled Plasma Source : Nuclear Science, Plasmas, and Electric Discharges
- C_4F_8O/O_2/N-based Additive Gases for Silicon Nitride Plasma Enhanced Chemical Vapor Deposition Chamber Cleaning with Low Global Warming Potentials
- Second-Harmonic Generation of GaAlAs Diode Laser by Enhanced Doubling in LiIO_3 Crystal
- Photoluminescence Properties of Eu3+ Activated CaMoSiO4 Red Phosphor by Combustion Method
- Etching of Copper Films for Thin Film Transistor Liquid Crystal Display using Inductively Coupled Chlorine-Based Plasmas