Ashida Hiroshi | The Authors Are With Advanced Material And Fram Development Dept. Ulsi Development Div. Fujitsu Limi
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The Authors Are With Advanced Material And Fram Development Dept. Ulsi Development Div. Fujitsu Limi | 論文
- Influence of Electrode Contacts on Leakage Current of SrTiO_3 Capacitors
- RuO_2 Thin Films as Bottom Electrodes for High Dielectric Constant Materials
- Effect of Zr/Ti Ratio on the Reliability Characteristics Behavior of Sol-Gel Derived PZT Films on Pt/IrO_2 Electrode(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)